Products

Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) Pieces Evaporation Materials High-Purity Chromium Oxide for Optical, Pigment, and Thin-Film Applications General Description Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) is a green crystalline compound with a corundum-type structure, where chromium occupies two-thirds of the octahedral sites...

Cell Lab 3N (99.9%) Hafnium Oxide (HfO₂) Pieces Evaporation Materials High-Purity HfO₂ for Semiconductor, Optical, and Dielectric Thin Films General Description Cell Lab 3N (99.9%) Hafnium Oxide (HfO₂), also known as hafnia, is a high-melting, thermally stable compound of hafnium used extensively in semiconductors, optical...

Cell Lab 4N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target High-Purity Ceramic Target for Thin-Film and Semiconductor Applications General Description Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target is engineered for thin-film deposition, transparent conductive coatings, and electronic device fabrication. With excellent...

Cell Lab 3N (99.9%) Silicon Nitride (Si₃N₄) Pieces – High-Purity Evaporation Material High-Purity Silicon Nitride for Thin-Film Deposition and High-Temperature Applications General Description Cell Lab 3N (99.9%) Silicon Nitride (Si₃N₄) Pieces are high-performance ceramic evaporation materials designed for thin-film coating, semiconductor processing, and optical...

Cell Lab 3N (99.9%) Tin Oxide (SnO₂) Pieces Evaporation Materials [3–12 mm] High-Purity SnO₂ for Thin-Film, Photovoltaic, and Ceramic Coating Applications General Description Cell Lab 3N (99.9%) Tin Oxide (SnO₂) Pieces are high-purity evaporation materials designed for optical coating, transparent conductive film deposition, and...

Cell Lab 3N (99.9%) Titanium Dioxide (TiO₂) Evaporation Materials [White Pieces, 3–6 mm] High-Purity Optical and Thin-Film Coating Material General Description Cell Lab 3N Titanium Dioxide (TiO₂) Evaporation Materials are high-purity, water-insoluble white solids supplied in uniform 3–6 mm pieces. TiO₂ is well-known for...

Cell Lab 3N (99.9%) Titanium Monoxide (TiO) Pieces and Tablets – High-Purity Evaporation Materials Advanced Conductive Oxide Material for Thin-Film and Semiconductor Research General Description Cell Lab 3N Titanium Monoxide (TiO) Evaporation Materials are high-purity inorganic compounds supplied in both pieces and tablet forms, ideal...

Cell Lab 3N (99.9%) Zinc Oxide (ZnO) Pieces Evaporation Materials [1–3 mm] High-Purity ZnO Source for Thin Film and Semiconductor Applications General Description Cell Lab 3N (99.9%) Zinc Oxide (ZnO) Pieces are precision-grade evaporation materials designed for thin-film deposition, semiconductor device fabrication, and photonic applications.As...

Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target High-Performance Ceramic Target for Thin-Film and Optical Coating Applications General Description Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target is a high-purity ceramic target designed for thin-film deposition, optical coatings, and semiconductor manufacturing. With its...

Cell Lab 3N5 (99.95%) Chromium (Cr) Pieces Evaporation Materials High-Purity Chromium for Optical, Decorative, and Functional Thin-Film Coatings General Description Cell Lab 3N5 (99.95%) Chromium (Cr) Pieces are high-purity metallic materials designed for vacuum evaporation, optical coatings, and microelectronic fabrication. Chromium is a silvery, lustrous,...