Sputtering Targets & Evaporation Materials

  • Featured
  • Best selling
  • Alphabetically, A-Z
  • Alphabetically, Z-A
  • Price, low to high
  • Price, high to low
  • Date, old to new
  • Date, new to old
Sort

Sort by:

  • Featured
  • Best selling
  • Alphabetically, A-Z
  • Alphabetically, Z-A
  • Price, low to high
  • Price, high to low
  • Date, old to new
  • Date, new to old
  • Cell Lab High-purity 99.99% iron oxide (Fe₃O₄) sputtering target for magnetic thin films, spintronics, and advanced semiconductor coating applications.
    Cell Lab
    Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target
    Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target High-Purity Fe₃O₄ Target for Thin-Film Deposition and Magnetic Applications General Description Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target is a high-purity ceramic target designed for magnetron sputtering, thin-film coating, and...
    from £249.00
    from £249.00
  • High-purity 99.99% aluminium sputtering target for optical, OLED, and semiconductor coatings. Excellent reflectivity, conductivity, and corrosion resistance.
    Cell Lab
    Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target
    Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target High-Purity Aluminium Target for Optical, OLED, and Semiconductor Coatings General Description Cell Lab 4N (99.99%) Aluminium Sputtering Target is manufactured from high-purity aluminium metal for consistent thin-film performance. Known for its low density, excellent electrical and thermal...
    from £59.00
    from £59.00
  • High-purity 99.999% copper sputtering target for electronic, optical, and photovoltaic coatings. Offers superior conductivity, adhesion, and uniform thin-film performance.
    Cell Lab
    Cell Lab 4N5 (99.995%) Copper (Cu) Sputtering Target
    Cell Lab 4N5 (99.995%) Copper (Cu) Sputtering Target High-Conductivity Copper Target for Thin Film Deposition and Electronic Applications General Description Cell Lab 4N5 (99.995%) Copper Sputtering Target is a high-purity metallic target engineered for semiconductor, microelectronic, and optical thin-film applications. Copper is a reddish-orange,...
    from £59.00
    from £59.00
  • High-purity 99.99% copper oxide sputtering target for semiconductors, photovoltaics, and gas sensors. Excellent p-type conductivity and stable thin-film performance.
    Cell Lab
    Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target
    Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target High-Purity CuO Target for Semiconductor and Photovoltaic Thin Films General Description Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target is designed for precision thin film deposition in semiconductors, solar cells, sensors, and optical coatings. CuO...
    from £259.00
    from £259.00
  • High-purity 99.995% selenium sputtering target for photovoltaic, semiconductor, and optical coatings. Ideal for CdSe, CIGS, and photoconductive thin-film deposition.
    Cell Lab
    Cell Lab 4N5 (99.995%) Selenium (Se) Sputtering Target
    Cell Lab 4N5 (99.995%) Selenium (Se) Sputtering Target High-Purity Selenium Target for Semiconductor and Photoconductive Coatings General Description Cell Lab 4N5 (99.995%) Selenium Sputtering Target is a precision-manufactured, high-purity target designed for thin film deposition in semiconductor, photovoltaic, and optoelectronic applications. Selenium is a non-metallic,...
    from £249.00
    from £249.00
  • High-purity 99.99% nickel sputtering target for thin film deposition, magnetic coatings, and semiconductor fabrication. Superior conductivity and corrosion resistance.
    Cell Lab
    Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target
    Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target High-Purity Nickel Target for Thin Film Deposition and Semiconductor Applications General Description Cell Lab 4N (99.99%) Nickel Sputtering Target is made from refined, high-purity nickel metal, ensuring superior performance in thin film coating and magnetically functional...
    from £119.00
    from £119.00
  • Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.
    Cell Lab
    Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target
    Cell Lab 4N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target High-Purity Ceramic Target for Thin-Film and Semiconductor Applications General Description Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target is engineered for thin-film deposition, transparent conductive coatings, and electronic device fabrication. With excellent...
    from £359.00
    from £359.00
  • Cell Lab premium zirconium oxide (ZrO₂) sputtering target (99.9% purity) for ceramic thin films, optical coatings, sensors, and semiconductor fabrication.
    Cell Lab
    Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target
    Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target High-Performance Ceramic Target for Thin-Film and Optical Coating Applications General Description Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target is a high-purity ceramic target designed for thin-film deposition, optical coatings, and semiconductor manufacturing. With its...
    from £439.00
    from £439.00
  • Cell Lab 3N (99.9%) Boron Pieces — high-purity B evaporation material for thin-film coating, semiconductor doping, and ceramic reinforcement. Excellent heat resistance, hardness, and optical performance for advanced vacuum deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Boron (B) Pieces Evaporation Materials
    Cell Lab 3N (99.9%) Boron (B) Pieces Evaporation Materials High-Purity Boron for Thin-Film Coatings, Semiconductor Doping, and Advanced Materials General Description Cell Lab 3N (99.9%) Boron (B) Pieces are high-purity evaporation materials used in thin-film deposition, semiconductor doping, and advanced material synthesis.Boron is a brittle,...
    from £599.00
    from £599.00
  • Cell Lab 3N (99.9%) Chromium Oxide Pieces — high-purity Cr₂O₃ evaporation material for optical coatings, pigments, and protective films. Excellent thermal stability, hardness, and green pigmentation for advanced vacuum deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) Pieces Evaporation Materials
    Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) Pieces Evaporation Materials High-Purity Chromium Oxide for Optical, Pigment, and Thin-Film Applications General Description Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) is a green crystalline compound with a corundum-type structure, where chromium occupies two-thirds of the octahedral sites...
    from £119.00
    from £119.00