Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.
Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.

Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target

Cell Lab 4N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target High-Purity Ceramic Target for Thin-Film and Semiconductor Applications General Description Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target is engineered for thin-film deposition, transparent conductive coatings, and electronic...
Vendor: Cell Lab
SKU: ST0141
Product type: Sputtering Targets
£359.00
£359.00
Choose your size to determine pricing for each: 1.0" Dia. x 0.125" Thick
Purity: 99.9%
Subtotal: £359.00
Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.

Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target

£359.00
Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.

Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target

£359.00
Choose your size to determine pricing for each: 1.0" Dia. x 0.125" Thick
Purity: 99.9%
Description
Description
x

Cell Lab 4N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target

High-Purity Ceramic Target for Thin-Film and Semiconductor Applications

General Description

Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target is engineered for thin-film deposition, transparent conductive coatings, and electronic device fabrication. With excellent thermal stability, high melting point, and reliable electrical performance, it is widely used in semiconductors, resistive switching devices, and optical coatings.

Nickel oxide is also valued for its p-type semiconducting properties, making it a key material for photovoltaic cells, sensors, and electrochromic devices.

Key Features

  • High Purity (99.9%) – Ensures minimal contamination and superior sputtering stability.

  • Excellent Thermal Resistance – Maintains performance at temperatures up to 1,955 °C.

  • Stable Structure – Provides uniform film deposition with high optical transparency.

  • Versatile Shapes and Sizes – Customisable discs, plates, and rectangular targets available.

  • Ideal for Oxide-Based Coatings – Commonly used for electronic, optical, and catalytic applications.

Technical Specifications

Parameter Specification
Material Nickel (II) Oxide
Chemical Formula NiO
CAS Number 1313-99-1
Purity 99.9%
Molar Mass 74.69 g/mol
Density 6.67 g/cm³
Melting Point 1,955 °C
Shape Options Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-made
Available Dimensions Max Ø200 mm, Length 300 mm, Width 200 mm, Thickness 1 mm, or Custom-made
Backing Plate Option Copper with Indium Bonding (optional, not included by default)

Applications & Industries

  • Semiconductors – Used as p-type material in thin-film transistors and diodes.

  • Optoelectronics – For transparent conductive oxide (TCO) coatings.

  • Photovoltaics – Applied in solar cell buffer and absorber layers.

  • Electrochromic Devices – Used in smart windows and display technologies.

  • Catalysis and Sensors – Serves as an active material in chemical and gas sensors.

FAQ

Q1: Can I order this target with a copper backing plate?
Yes, a Cu backing plate with indium bonding is available as an optional upgrade (not included by default).

Q2: Are custom dimensions available?
Yes, Cell Lab can machine discs, plates, or rectangular targets to your exact specifications.

Q3: What sputtering systems are compatible with this target?
It is suitable for RF and DC magnetron sputtering systems across various deposition setups.

Shipping & Return
Shipping & Return
x

Returns Policy

You may return most new, unopened items within 30 days of delivery for a full refund. We'll also pay the return shipping costs if the return is a result of our error (you received an incorrect or defective item, etc.).

You should expect to receive your refund within four weeks of giving your package to the return shipper, however, in many cases you will receive a refund more quickly. This time period includes the transit time for us to receive your return from the shipper (5 to 10 business days), the time it takes us to process your return once we receive it (3 to 5 business days), and the time it takes your bank to process our refund request (5 to 10 business days).

If you need to return an item, simply login to your account, view the order using the "Complete Orders" link under the My Account menu and click the Return Item(s) button. We'll notify you via e-mail of your refund once we've received and processed the returned item.

Shipping

We can ship to virtually any address in the world. Note that there are restrictions on some products, and some products cannot be shipped to international destinations.

When you place an order, we will estimate shipping and delivery dates for you based on the availability of your items and the shipping options you choose. Depending on the shipping provider you choose, shipping date estimates may appear on the shipping quotes page.

Please also note that the shipping rates for many items we sell are weight-based. The weight of any such item can be found on its detail page. To reflect the policies of the shipping companies we use, all weights will be rounded up to the next full pound.

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