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High-Purity Silicon Nitride for Thin-Film Deposition and High-Temperature Applications
Cell Lab 3N (99.9%) Silicon Nitride (Si₃N₄) Pieces are high-performance ceramic evaporation materials designed for thin-film coating, semiconductor processing, and optical applications. Known for their exceptional hardness, chemical stability, and high melting point (~1900 °C), these materials ensure consistent, contamination-free evaporation in both thermal and e-beam deposition systems.
Their fine purity and controlled particle size (1–3 mm or 3–6 mm) make them ideal for producing high-quality nitride coatings, barrier layers, and dielectric films across semiconductor, optical, and aerospace industries.
High Purity 99.9% (3N) – Ensures minimal contamination during evaporation or sputtering processes.
Excellent Thermal Stability – Withstands temperatures up to 1900 °C with low thermal expansion.
Superior Chemical Resistance – Inert to most acids and alkalis, maintaining integrity in reactive environments.
Optimised Particle Size – Available in 1–3 mm and 3–6 mm sizes for uniform heating and efficient material utilisation.
Customisable Form – Shape, size, and packaging can be tailored for specific vacuum coating systems.
| Parameter | Specification |
|---|---|
| Chemical Formula | Si₃N₄ |
| Purity | 99.9% (3N) |
| Appearance | White to Grey Solid |
| Size Options | 1–3 mm / 3–6 mm (Customisable) |
| Melting Point | 1900 °C |
| Theoretical Density | 3.17 g/cm³ |
| Evaporation Method | Thermal or E-beam |
| Crucible Compatibility | Alumina, Tungsten, Graphite, or BN crucibles recommended |
| Customisation | Particle size, form, and purity available upon request |
Thin-film deposition for semiconductors and optical coatings
Dielectric and insulating film fabrication
High-temperature crucible coating and barrier layers
Plasma-resistant coating materials
Research and development in electronics, optics, and aerospace
Q1: Why is Si₃N₄ preferred for evaporation applications?
Silicon nitride combines high strength and thermal shock resistance, allowing uniform evaporation and reliable thin-film formation even under extreme temperatures.
Q2: What crucibles are suitable for Si₃N₄ evaporation?
Alumina, tungsten, boron nitride, or graphite crucibles are recommended for optimal thermal performance and material compatibility.
Q3: Can I request a customised size or purity?
Yes, Cell Lab offers tailored dimensions, particle size, and purities (up to 4N) to meet specific R&D or production requirements.
Q4: What are typical use cases in the semiconductor industry?
Si₃N₄ is commonly used in dielectric coatings, passivation layers, and optical interference films.
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