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Sputtering Targets & Evaporation Materials

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  • Cell Lab High-purity 99.99% iron oxide (Fe₃O₄) sputtering target for magnetic thin films, spintronics, and advanced semiconductor coating applications.
    Cell Lab
    Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target
    Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target High-Purity Fe₃O₄ Target for Thin-Film Deposition and Magnetic Applications General Description Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target is a high-purity ceramic target designed for magnetron sputtering, thin-film coating, and...
    from £249.00
    from £249.00
  • High-purity 99.99% aluminium sputtering target for optical, OLED, and semiconductor coatings. Excellent reflectivity, conductivity, and corrosion resistance.
    Cell Lab
    Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target
    Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target High-Purity Aluminium Target for Optical, OLED, and Semiconductor Coatings General Description Cell Lab 4N (99.99%) Aluminium Sputtering Target is manufactured from high-purity aluminium metal for consistent thin-film performance. Known for its low density, excellent electrical and thermal...
    from £59.00
    from £59.00
  • High-purity 99.999% copper sputtering target for electronic, optical, and photovoltaic coatings. Offers superior conductivity, adhesion, and uniform thin-film performance.
    Cell Lab
    Cell Lab 4N5 (99.995%) Copper (Cu) Sputtering Target
    Cell Lab 4N5 (99.995%) Copper (Cu) Sputtering Target High-Conductivity Copper Target for Thin Film Deposition and Electronic Applications General Description Cell Lab 4N5 (99.995%) Copper Sputtering Target is a high-purity metallic target engineered for semiconductor, microelectronic, and optical thin-film applications. Copper is a reddish-orange,...
    from £59.00
    from £59.00
  • High-purity 99.99% copper oxide sputtering target for semiconductors, photovoltaics, and gas sensors. Excellent p-type conductivity and stable thin-film performance.
    Cell Lab
    Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target
    Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target High-Purity CuO Target for Semiconductor and Photovoltaic Thin Films General Description Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target is designed for precision thin film deposition in semiconductors, solar cells, sensors, and optical coatings. CuO...
    from £259.00
    from £259.00
  • High-purity 99.995% selenium sputtering target for photovoltaic, semiconductor, and optical coatings. Ideal for CdSe, CIGS, and photoconductive thin-film deposition.
    Cell Lab
    Cell Lab 4N5 (99.995%) Selenium (Se) Sputtering Target
    Cell Lab 4N5 (99.995%) Selenium (Se) Sputtering Target High-Purity Selenium Target for Semiconductor and Photoconductive Coatings General Description Cell Lab 4N5 (99.995%) Selenium Sputtering Target is a precision-manufactured, high-purity target designed for thin film deposition in semiconductor, photovoltaic, and optoelectronic applications. Selenium is a non-metallic,...
    from £249.00
    from £249.00
  • High-purity 99.99% nickel sputtering target for thin film deposition, magnetic coatings, and semiconductor fabrication. Superior conductivity and corrosion resistance.
    Cell Lab
    Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target
    Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target High-Purity Nickel Target for Thin Film Deposition and Semiconductor Applications General Description Cell Lab 4N (99.99%) Nickel Sputtering Target is made from refined, high-purity nickel metal, ensuring superior performance in thin film coating and magnetically functional...
    from £119.00
    from £119.00
  • Cell Lab High-purity 99.9% nickel oxide (NiO) sputtering target for thin-film deposition, semiconductor coatings, and optoelectronic device manufacturing.
    Cell Lab
    Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target
    Cell Lab 4N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target High-Purity Ceramic Target for Thin-Film and Semiconductor Applications General Description Cell Lab 3N (99.9%) Nickel (II) Oxide (NiO) Sputtering Target is engineered for thin-film deposition, transparent conductive coatings, and electronic device fabrication. With excellent...
    from £359.00
    from £359.00
  • Cell Lab premium zirconium oxide (ZrO₂) sputtering target (99.9% purity) for ceramic thin films, optical coatings, sensors, and semiconductor fabrication.
    Cell Lab
    Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target
    Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target High-Performance Ceramic Target for Thin-Film and Optical Coating Applications General Description Cell Lab 3N (99.9%) Zirconium Oxide (ZrO₂) Sputtering Target is a high-purity ceramic target designed for thin-film deposition, optical coatings, and semiconductor manufacturing. With its...
    from £439.00
    from £439.00
  • Cell Lab 3N (99.9%) Boron Pieces — high-purity B evaporation material for thin-film coating, semiconductor doping, and ceramic reinforcement. Excellent heat resistance, hardness, and optical performance for advanced vacuum deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Boron (B) Pieces Evaporation Materials
    Cell Lab 3N (99.9%) Boron (B) Pieces Evaporation Materials High-Purity Boron for Thin-Film Coatings, Semiconductor Doping, and Advanced Materials General Description Cell Lab 3N (99.9%) Boron (B) Pieces are high-purity evaporation materials used in thin-film deposition, semiconductor doping, and advanced material synthesis.Boron is a brittle,...
    from £599.00
    from £599.00
  • Cell Lab 3N (99.9%) Chromium Oxide Pieces — high-purity Cr₂O₃ evaporation material for optical coatings, pigments, and protective films. Excellent thermal stability, hardness, and green pigmentation for advanced vacuum deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) Pieces Evaporation Materials
    Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) Pieces Evaporation Materials High-Purity Chromium Oxide for Optical, Pigment, and Thin-Film Applications General Description Cell Lab 3N (99.9%) Chromium Oxide (Cr₂O₃) is a green crystalline compound with a corundum-type structure, where chromium occupies two-thirds of the octahedral sites...
    from £119.00
    from £119.00
  • Cell Lab 3N5 (99.95%) Cobalt Pellets — high-purity Co evaporation material for magnetic storage, thin-film coating, and Li-ion battery research. Excellent thermal stability, conductivity, and ferromagnetic performance for vacuum deposition.
    Cell Lab
    Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials
    Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials High-Purity Ferromagnetic Material for Thin-Film and Battery Applications General Description Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets are precision-engineered evaporation materials designed for vacuum deposition, magnetic thin-film coating, and energy research. Cobalt is a lustrous, hard,...
    from £179.00
    from £179.00
  • Cell Lab 5N (99.999%) Copper Pellets — ultra-pure Cu evaporation material for semiconductor, sensor, and optical coatings. Superior conductivity, high purity, and stable thin-film performance for precision vacuum deposition.
    Cell Lab
    Cell Lab 5N (99.999%) Copper (Cu) Pellets Evaporation Materials
    Cell Lab 5N (99.999%) Copper (Cu) Pellets Evaporation Materials Ultra-High Purity Copper for Semiconductor and Thin-Film Deposition General Description Cell Lab 5N (99.999%) Copper (Cu) Pellets are high-purity metallic materials designed for precision evaporation in semiconductor, optoelectronic, and sensor applications. With exceptional thermal and electrical...
    from £49.60
    from £49.60
  • Cell Lab 3N (99.9%) Hafnium Oxide Pieces — premium HfO₂ evaporation material for semiconductor, dielectric, and optical coating applications. High melting point, chemical stability, and superior thin-film performance for precision deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Hafnium Oxide (HfO₂) Pieces Evaporation Materials
    Cell Lab 3N (99.9%) Hafnium Oxide (HfO₂) Pieces Evaporation Materials High-Purity HfO₂ for Semiconductor, Optical, and Dielectric Thin Films General Description Cell Lab 3N (99.9%) Hafnium Oxide (HfO₂), also known as hafnia, is a high-melting, thermally stable compound of hafnium used extensively in semiconductors, optical...
    from £259.00
    from £259.00
  • Cell Lab 4N5 (99.995%) Lead Pieces — ultra-pure Pb evaporation material for semiconductors, solar cells, and infrared coatings. Excellent thermal stability, uniform film deposition, and compatibility with W/Mo/Al₂O₃ crucibles.
    Cell Lab
    Cell Lab 4N5 (99.995%) Lead (Pb) Pieces Evaporation Materials
    Cell Lab 4N5 (99.995%) Lead (Pb) Pieces Evaporation Materials High-Purity Lead for Semiconductor, Photovoltaic, and Infrared Applications General Description Cell Lab 4N5 (99.995%) Lead (Pb) Pieces are ultra-high-purity evaporation materials ideal for thin-film deposition, infrared detection, and photovoltaic fabrication. Lead’s unique combination of high density,...
    from £119.00
    from £119.00
  • Cell Lab 3N (99.9%) Magnesium Aluminate Pieces — high-purity MgAl₂O₄ spinel material for optical coatings, refractories, and battery applications. Exceptional thermal resistance, transparency, and corrosion stability for precision thin-film deposition.
    Cell Lab
    Cell Lab 3N (99.9%) Magnesium Aluminate (MgAl₂O₄) Pieces Evaporation Materials [3–12 mm]
    Cell Lab 3N (99.9%) Magnesium Aluminate (MgAl₂O₄) Pieces Evaporation Materials [3–12 mm] High-Strength Spinel Material for Optical Coatings, Refractory, and Battery Research General Description Cell Lab 3N (99.9%) Magnesium Aluminate (MgAl₂O₄) Pieces, also known as spinel (MAS), are synthetic cubic crystal materials combining high strength,...
    from £209.00
    from £209.00
  • Cell Lab 3N5 (99.95%) Magnesium Fluoride Pieces — premium MgF₂ evaporation material for optical coatings, solar cells, and laser optics. High transparency, low refractive index, and excellent thermal stability for precision thin-film deposition.
    Cell Lab
    Cell Lab 3N5 (99.95%) Magnesium Fluoride (MgF₂) Pieces Evaporation Materials [1–3 mm]
    Cell Lab 3N5 (99.95%) Magnesium Fluoride (MgF₂) Pieces Evaporation Materials [1–3 mm] High-Transparency MgF₂ for Optical Coatings, Solar Cells, and Laser Applications General Description Cell Lab 3N5 (99.95%) Magnesium Fluoride (MgF₂) Pieces are high-purity alkaline earth metal fluoride materials designed for optical coating, antireflection layers,...
    from £119.00
    from £119.00
  • Cell Lab 3N5 (99.95%) Magnesium Oxide Pieces — high-purity MgO evaporation material for thin-film coatings, superconductors, and Li-ion battery research. Excellent stability, high melting point, and corrosion resistance for advanced R&D.
    Cell Lab
    Cell Lab 3N5 (99.95%) Magnesium Oxide (MgO) Pieces Evaporation Materials [1–3 mm]
    Cell Lab 3N5 (99.95%) Magnesium Oxide (MgO) Pieces Evaporation Materials [1–3 mm] High-Purity MgO for Thin-Film Deposition, Catalysis, and Battery Research General Description Cell Lab 3N5 (99.95%) Magnesium Oxide (MgO) Pieces are high-purity evaporation materials designed for vacuum coating, superconductor research, and catalytic applications. With...
    from £159.00
    from £159.00
  • Cell Lab 3N5 (99.95%) Manganese Pieces — high-purity Mn evaporation materials for thin-film coatings, alloying, and fuel cell research. Excellent thermal stability, conductivity, and vacuum compatibility for advanced R&D and production.
    Cell Lab
    Cell Lab 3N5 (99.95%) Manganese (Mn) Pieces Evaporation Materials [3–12 mm]
    Cell Lab 3N5 (99.95%) Manganese (Mn) Pieces Evaporation Materials [3–12 mm] High-Purity Manganese for Thin-Film Deposition, Alloying, and Fuel Cell Research General Description Cell Lab 3N5 (99.95%) Manganese (Mn) Pieces are high-purity evaporation materials designed for vacuum deposition, alloy production, and energy research. As...
    from £69.00
    from £69.00
  • Cell Lab 3N5 (99.95%) Molybdenum Pellets — high-purity evaporation material for thin-film coatings, sensors, and high-temperature alloys. Exceptional conductivity, wear resistance, and thermal stability for advanced R&D and industrial use.
    Cell Lab
    Cell Lab 3N5 (99.95%) Molybdenum (Mo) Pellets Evaporation Materials
    Cell Lab 3N5 (99.95%) Molybdenum (Mo) Pellets Evaporation Materials High-Purity Molybdenum Pellets for Thin-Film Deposition and High-Temperature Applications General Description Cell Lab 3N5 (99.95%) Molybdenum (Mo) Pellets are high-purity refractory metal evaporation materials engineered for vacuum coating, metallurgical, and semiconductor applications. With their outstanding thermal...
    from £179.00
    from £179.00
  • Cell Lab 3N5 (99.95%) Molybdenum Wire — high-purity 1 mm evaporation material for vacuum coating, sensors, and refractory applications. Excellent thermal conductivity, stability, and strength at extreme temperatures.
    Cell Lab
    Cell Lab 3N5 (99.95%) Molybdenum (Mo) Wire Evaporation Materials [1 mm Dia]
    Cell Lab 3N5 (99.95%) Molybdenum (Mo) Wire Evaporation Materials [1 mm Dia] High-Temperature Molybdenum Wire for Vacuum Coating, Sensors, and Metallurgical Applications General Description Cell Lab 3N5 (99.95%) Molybdenum (Mo) Wire is a high-purity refractory metal evaporation material known for its exceptional thermal stability, conductivity,...
    from £69.00
    from £69.00

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