Products

Cell Lab 3N5 (99.95%) Niobium (Nb) Pellets Evaporation Materials [2 mm Dia × 5–8 mm L] High-Purity Niobium for Thin-Film, Superconducting, and Coating Applications General Description Cell Lab 3N5 (99.95%) Niobium (Nb) Pellets are premium-quality evaporation materials engineered for vacuum coating, superconducting, and surface protection...

Cell Lab 3N5 (99.95%) Tantalum (Ta) Pellets Evaporation Materials High-Purity Refractory Metal for Thin-Film and Vacuum Coating Applications General Description Cell Lab 3N5 (99.95%) Tantalum (Ta) Pellets are designed for thermal and e-beam evaporation in thin-film deposition, semiconductor fabrication, and optical coating industries. As a...

Cell Lab 3N5 (99.95%) Tantalum (Ta) Wire Evaporation Materials [1 m Length] High-Purity Refractory Metal Wire for Thin-Film and Optical Applications General Description Cell Lab 3N5 (99.95%) Tantalum (Ta) Wire is engineered for vacuum evaporation, thin-film coating, and high-temperature applications. Tantalum is a rare, hard,...

Cell Lab 3N5 (99.95%) Tantalum Pentoxide (Ta₂O₅) Tablets Evaporation Materials [1–6 mm] High-Refractive Optical and Dielectric Coating Material General Description Cell Lab 3N5 (99.95%) Tantalum Pentoxide (Ta₂O₅) Tablets are premium-grade evaporation materials used in thin-film coating and electronic component manufacturing.Tantalum Pentoxide is a white...

Cell Lab 3N5 (99.95%) Titanium (Ti) Pellets – High Purity Evaporation Material High-Purity Titanium Pellets for Thin-Film Coating and Metallurgical Applications General Description Cell Lab 3N5 (99.95%) Titanium (Ti) Pellets are high-purity evaporation materials designed for advanced thin-film deposition, metallurgical research, and high-precision coating...

Cell Lab 3N8 (99.98%) Nickel (Ni) Wire Evaporation Materials [0.5 mm Dia × 20 m L] High-Purity Nickel Wire for Vacuum Coating and Electronic Applications General Description Cell Lab 3N8 (99.98%) Nickel (Ni) Wire is a silvery-white, lustrous metal with a slight golden tint, engineered...

Cell Lab 3N8 (99.98%) Titanium (Ti) Wire Evaporation Materials [1 m Length] High-Purity Titanium Wire for Precision Thin-Film Deposition General Description Cell Lab 3N8 (99.98%) Titanium (Ti) Wire is a high-purity evaporation material designed for advanced thin-film deposition and metallisation processes. Titanium’s exceptional corrosion...

Cell Lab 40 mm XRF Pellet Pressing Die Set High-strength alloy steel die for precise XRF pellet preparation General Description The Cell Lab 40 mm XRF Pellet Pressing Die Set is engineered for preparing high-quality pressed powder pellets for X-ray fluorescence spectroscopy (XRF). Constructed...

Cell Lab 4680 Cylinder Cell Case [4680 Battery Case | EV Cylindrical Cell Housing | Nickel-Plated Steel, 25 pcs] High-strength cylindrical cell housing for next-generation EV battery pack assembly The Cell Lab 4680 Cylinder Cell Case is engineered for advanced electric vehicle (EV) and...

Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target High-Purity Aluminium Target for Optical, OLED, and Semiconductor Coatings General Description Cell Lab 4N (99.99%) Aluminium Sputtering Target is manufactured from high-purity aluminium metal for consistent thin-film performance. Known for its low density, excellent electrical and thermal...

Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target High-Purity CuO Target for Semiconductor and Photovoltaic Thin Films General Description Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target is designed for precision thin film deposition in semiconductors, solar cells, sensors, and optical coatings. CuO...

Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target High-Purity Fe₃O₄ Target for Thin-Film Deposition and Magnetic Applications General Description Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target is a high-purity ceramic target designed for magnetron sputtering, thin-film coating, and...

Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target High-Purity Nickel Target for Thin Film Deposition and Semiconductor Applications General Description Cell Lab 4N (99.99%) Nickel Sputtering Target is made from refined, high-purity nickel metal, ensuring superior performance in thin film coating and magnetically functional...

Cell Lab 4N (99.99%) Silicon Dioxide (SiO₂) Pieces Evaporation Materials High-Purity Silica for Optical, Electronic, and Structural Coatings General Description Cell Lab 4N (99.99%) Silicon Dioxide (SiO₂) Pieces are premium-grade evaporation materials widely used in thin-film deposition, optical coatings, and semiconductor applications.Also known as silica,...

Cell Lab 4N (99.99%) Silicon Monoxide (SiO) Pieces Evaporation Materials [1–3 mm] High-Purity Silicon Oxide for Thin-Film and Semiconductor Applications General Description Cell Lab 4N (99.99%) Silicon Monoxide (SiO) Pieces are refined evaporation-grade materials designed for thin-film deposition, semiconductor fabrication, and advanced optical coatings.Silicon monoxide...

Cell Lab 4N (99.99%) Sodium Fluoride (NaF) Sputtering Target High-Purity NaF Target for Optical Coatings and Electronic Applications General Description Cell Lab 4N (99.99%) Sodium Fluoride (NaF) Sputtering Target is a high-purity ceramic material widely used for optical coatings, dielectric layers, and thin-film deposition. Known...

Cell Lab 4N (99.99%) Tin (Sn) Pellets Evaporation Materials High-Purity Tin Pellets for Thin-Film Deposition and Optoelectronic Applications General Description Cell Lab 4N (99.99%) Tin (Sn) Pellets are premium-grade evaporation materials used for thin-film coating, optoelectronic applications, and metal alloy research.Tin is a silvery-white,...

Cell Lab 4N (99.99%) Zinc (Zn) Pellets Evaporation Materials High-Purity Zinc Source for Thin Film, Optical, and Semiconductor Applications General Description Cell Lab 4N (99.99%) Zinc (Zn) Pellets are precision-engineered evaporation materials designed for thin-film deposition, optical coatings, and semiconductor processing.Zinc is a bluish pale-grey...

Cell Lab 4N (99.99%) Zinc Sulfide (ZnS) Pieces Evaporation Materials [3–12 mm] High-Purity ZnS for Optical Coating and Semiconductor Applications General Description Cell Lab 4N (99.99%) Zinc Sulfide (ZnS) Pieces are premium-grade evaporation materials engineered for optical coating, semiconductor, and thin-film applications. Owing to...

Cell Lab 4N5 (99.995%) Copper (Cu) Sputtering Target High-Conductivity Copper Target for Thin Film Deposition and Electronic Applications General Description Cell Lab 4N5 (99.995%) Copper Sputtering Target is a high-purity metallic target engineered for semiconductor, microelectronic, and optical thin-film applications. Copper is a reddish-orange,...