Products

Cell Lab 3N8 (99.98%) Titanium (Ti) Wire Evaporation Materials [1 m Length] High-Purity Titanium Wire for Precision Thin-Film Deposition General Description Cell Lab 3N8 (99.98%) Titanium (Ti) Wire is a high-purity evaporation material designed for advanced thin-film deposition and metallisation processes. Titanium’s exceptional corrosion...

Cell Lab 40 mm XRF Pellet Pressing Die Set High-strength alloy steel die for precise XRF pellet preparation General Description The Cell Lab 40 mm XRF Pellet Pressing Die Set is engineered for preparing high-quality pressed powder pellets for X-ray fluorescence spectroscopy (XRF). Constructed...

Special Order Cell Lab 40mm Polished Pressing Disc (spacers)

Cell Lab 4680 Cylinder Cell Case [4680 Battery Case | EV Cylindrical Cell Housing | Nickel-Plated Steel, 25 pcs] High-strength cylindrical cell housing for next-generation EV battery pack assembly The Cell Lab 4680 Cylinder Cell Case is engineered for advanced electric vehicle (EV) and...

Cell Lab 4N (99.99%) Aluminium (Al) Sputtering Target High-Purity Aluminium Target for Optical, OLED, and Semiconductor Coatings General Description Cell Lab 4N (99.99%) Aluminium Sputtering Target is manufactured from high-purity aluminium metal for consistent thin-film performance. Known for its low density, excellent electrical and thermal...

Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target High-Purity CuO Target for Semiconductor and Photovoltaic Thin Films General Description Cell Lab 4N (99.99%) Copper Oxide (CuO) Sputtering Target is designed for precision thin film deposition in semiconductors, solar cells, sensors, and optical coatings. CuO...

Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target High-Purity Fe₃O₄ Target for Thin-Film Deposition and Magnetic Applications General Description Cell Lab 4N (99.99%) Iron (II, III) Oxide (Fe₃O₄) Sputtering Target is a high-purity ceramic target designed for magnetron sputtering, thin-film coating, and...

Cell Lab 4N (99.99%) Nickel (Ni) Sputtering Target High-Purity Nickel Target for Thin Film Deposition and Semiconductor Applications General Description Cell Lab 4N (99.99%) Nickel Sputtering Target is made from refined, high-purity nickel metal, ensuring superior performance in thin film coating and magnetically functional...

Cell Lab 4N (99.99%) Silicon Dioxide (SiO₂) Pieces Evaporation Materials High-Purity Silica for Optical, Electronic, and Structural Coatings General Description Cell Lab 4N (99.99%) Silicon Dioxide (SiO₂) Pieces are premium-grade evaporation materials widely used in thin-film deposition, optical coatings, and semiconductor applications.Also known as silica,...

Cell Lab 4N (99.99%) Silicon Monoxide (SiO) Pieces Evaporation Materials [1–3 mm] High-Purity Silicon Oxide for Thin-Film and Semiconductor Applications General Description Cell Lab 4N (99.99%) Silicon Monoxide (SiO) Pieces are refined evaporation-grade materials designed for thin-film deposition, semiconductor fabrication, and advanced optical coatings.Silicon monoxide...