Cell Lab Indium (III) Oxide (In₂O₃) [99.999% 5N High Purity Powder] – Ultra-High-Purity Indium Oxide for Optoelectronic, Battery

Cell Lab Indium (III) Oxide (In₂O₃) [99.999% 5N High Purity Powder] – Ultra-High-Purity Indium Oxide for Optoelectronic, Battery, and Thin-Film Applications

Exceptional purity and stability for advanced material research and electronic manufacturing

The Cell Lab Indium (III) Oxide (In₂O₃) is a 99.999% (5N) ultra-high-purity oxide powder engineered for next-generation optoelectronic, photovoltaic, and energy-storage research. With its low trace-metal content, excellent optical transparency, and stable electronic structure, this material is ideal for ITO (Indium Tin Oxide) coatings, thin-film deposition, and semiconductor doping.

Its controlled particle size and uniform morphology make it highly suitable for transparent conductive oxides (TCOs), battery research, display technologies, and advanced ceramics. All batches are produced under strict contamination-control conditions and vacuum-sealed for long-term storage stability.

Key Features

5N Ultra-High Purity (99.999%)
Ensures minimal impurities and reliable performance in sensitive electronic applications.

Superior Optical and Electrical Properties
Enables high-transparency conductive coatings when doped with SnO₂ to form ITO films.

Versatile Functional Applications
Applicable in batteries, sensors, solar cells, and semiconductor processing.

Controlled Particle Uniformity
Fine yellowish powder with excellent packing density and dispersion characteristics.

Research-Grade Processing & Packaging
Manufactured and packaged in contamination-free environments to preserve purity.

Technical Specifications

Typical Trace Metals Analysis (ppm)

Applications & Industries

• Transparent conductive oxide (ITO) coatings for displays and photovoltaics

• Doping and sputtering target material for semiconductor fabrication

• Lithium-ion and solid-state battery electrode and electrolyte research

• Optical coatings and gas-sensing devices

• Photonic and thin-film deposition systems

Handling & Storage

• Store in a dry, contamination-free environment.

• Avoid moisture and direct contact with acidic vapours.

• For thin-film deposition, handle under inert gas to preserve powder quality.

• SDS, CoA, and bulk quotation available upon request.

FAQ

Q1: What makes 5N In₂O₃ superior to standard grades?
The 5N (99.999%) purity level ensures minimal contamination, crucial for optoelectronic and ITO film applications.

Q2: Can it be used for sputtering targets or CVD processes?
Yes. It is compatible with both sputtering and chemical vapour deposition to produce transparent conductive coatings.

Q3: Is this powder suitable for battery R&D?
Yes. It has demonstrated stable performance in solid-state electrolytes and anode coating layers.

Q4: How should it be handled to avoid contamination?
Use clean, inert tools (preferably ceramic or PTFE) in a dry glove box or controlled-humidity lab.

Q5: Are bulk or customised purities available?
Yes. Cell Lab provides tailored purities, particle sizes, and quantities for pilot or industrial use.