Cell Lab 3N5 (99.95%) Cobalt Pellets — high-purity Co evaporation material for magnetic storage, thin-film coating, and Li-ion battery research. Excellent thermal stability, conductivity, and ferromagnetic performance for vacuum deposition.
Cell Lab 3N5 (99.95%) Cobalt Pellets — high-purity Co evaporation material for magnetic storage, thin-film coating, and Li-ion battery research. Excellent thermal stability, conductivity, and ferromagnetic performance for vacuum deposition.

Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials

Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials High-Purity Ferromagnetic Material for Thin-Film and Battery Applications General Description Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets are precision-engineered evaporation materials designed for vacuum deposition, magnetic thin-film coating, and energy research. Cobalt...
Vendor: Cell Lab
SKU: ST0103
Product type: Evaporation Materials
£179.00
£179.00
Size: 1/4" Diameter x 1/4" Length
Weight: 50g
Subtotal: £179.00
Description
Description
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Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets Evaporation Materials

High-Purity Ferromagnetic Material for Thin-Film and Battery Applications

General Description

Cell Lab 3N5 (99.95%) Cobalt (Co) Pellets are precision-engineered evaporation materials designed for vacuum deposition, magnetic thin-film coating, and energy research. Cobalt is a lustrous, hard, greyish metallic element known for its ferromagnetic behaviour, excellent thermal stability, and corrosion resistance.

Due to its ability to form strong magnetic alloys and stable thin films, cobalt is widely used in magnetic storage media, battery fabrication, and semiconductor coatings. Its high melting point of 1,495 °C and low vapour pressure characteristics make it ideal for controlled thermal and electron-beam evaporation processes.

Key Features

  • High Purity (99.95%) – Ensures low contamination in precision coating and vacuum deposition systems.

  • Ferromagnetic Properties – Ideal for magnetic thin-film deposition and data storage technologies.

  • Thermal Stability – Maintains structure and conductivity at high operating temperatures.

  • Excellent Adhesion – Forms uniform, adherent coatings on a wide range of substrates.

  • Versatile Use – Suitable for evaporation, sputtering, and metallisation in electronic devices.

Technical Specifications

Parameter Specification
Material Cobalt
Symbol Co
Purity 99.95% (3N5)
Atomic Number 27
Atomic Mass 58.9332
Colour / Appearance Lustrous, Metallic, Greyish Tinge
Melting Point 1,495 °C
Thermal Conductivity 100 W/m·K
Coefficient of Thermal Expansion 13.0 × 10⁻⁶ /K
Theoretical Density 8.9 g/cm³
Vapour Pressure (10⁻⁴ Torr) ~1,200 °C
Thermal Evaporation Techniques Boat: W, Nb Basket: W Crucible: Al₂O₃
E-Beam Crucible Liner Material Graphite, Tungsten

Applications & Industries

  • Magnetic Storage Media – Used as a ferromagnetic layer for hard drives and data storage films.

  • Battery Fabrication – Serves as a transitional layer in Li-ion and solid-state batteries.

  • Alloy Production – Component for high-strength superalloys in aerospace and energy sectors.

  • Optical and Electronic Devices – Applied in sensors, resistors, and conductive coatings.

  • Decorative & Functional Coatings – Used in thin-film deposition for jewellery and glass pigmentation.

FAQ

Q1: Why is cobalt preferred for magnetic film deposition?
Cobalt’s ferromagnetic nature and high Curie temperature make it essential for thin films requiring strong, stable magnetic properties.

Q2: What are the recommended crucible materials for evaporation?
Al₂O₃ crucibles or W/Nb boats provide excellent compatibility and temperature control.

Q3: Is cobalt suitable for co-evaporation processes?
Yes. It is frequently co-evaporated with nickel or platinum to produce multilayer magnetic or conductive coatings.

Q4: Can this material be used in semiconductor research?
Absolutely. Cobalt is widely used in interconnect metallisation and diffusion barrier layers in semiconductor fabrication.

Shipping & Return
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