Cell Lab High Purity Alumina (Al₂O₃) Plates [99 % Purity]

Cell Lab High Purity Alumina (Al₂O₃) Plates [99 % Purity]

High-temperature, corrosion-resistant ceramic plates for calcination, sintering and industrial applications

General Description

Cell Lab Alumina (Al₂O₃) Plates are engineered from > 99 % pure aluminium oxide ceramic, offering exceptional hardness, thermal stability, and electrical insulation. With a melting point above 2000 °C and excellent resistance to wear and corrosion, these plates perform reliably in furnaces, metallurgy, chemical processing, and materials research.

The plates maintain mechanical strength and dimensional stability even under extreme thermal cycling. Their low thermal expansion ensures minimal distortion during calcination or sintering, making them ideal for laboratory and industrial high-temperature environments.

Custom sizes and tight-tolerance machining are available upon request.

Key Features

• High purity Al₂O₃ (> 99 %) for superior hardness and thermal resistance.

• Excellent electrical insulation for high-voltage or furnace environments.

• Low thermal expansion and good shock resistance ensure durability in rapid heating and cooling cycles.

• Corrosion and oxidation resistant, suitable for metallurgical and chemical use.

• Custom dimensions and machined finishes available for research and production applications.

Technical Specifications

Custom Options: Dimensions and polishing available upon request.

Applications & Industries

• Laboratory calcination and sintering platforms

• Metallurgical and chemical processing equipment

• Furnace liners and crucible supports

• Electrical insulation plates and vacuum fixtures

• Automotive and aerospace thermal components

FAQ

Q1: Can these alumina plates withstand repeated high-temperature cycling?
A1: Yes. Their low thermal expansion and high mechanical strength allow excellent performance even under repeated heating and cooling up to 1600 °C.

Q2: Are these plates electrically conductive?
A2: No. They offer excellent dielectric insulation, making them ideal for high-voltage or plasma applications.

Q3: Can I order polished or machined surfaces?
A3: Absolutely. We can provide polished or tight-tolerance machining according to your specifications.

Q4: What precautions should I take during first use?
A4: Before initial heating, dry the plate at > 105 °C for 2 hours to remove moisture, and heat/cool at rates below 5 °C per minute (< 1200 °C).

Q5: Is this product suitable for chemical vapor deposition (CVD) systems?
A5: Yes. High-purity Al₂O₃ plates are ideal for CVD, PVD, and plasma process applications due to their stability and chemical inertness.